Lithography

Vacuum Deposition

@@ Line 49: / Line 49: @@
 |}
-=Dry Etch=
+= Dry Etch =
 {|
-|-valign="top"
+|- valign="top"
-|width=300|
+| width="300" |
-* [[RIE 1 (Custom)]]
+*[[RIE 1 (Custom)]]
-* [[RIE 2 (MRC)]]
+*[[RIE 2 (MRC)]]
-* [[RIE 3 (MRC)]]
+*[[RIE 3 (MRC)]]
-* [[RIE 5 (PlasmaTherm SLR)]]
+*[[RIE 5 (PlasmaTherm SLR)]]
-* [[Si Deep RIE (Bosch Etch)]]
+*[[Si Deep RIE (Bosch Etch)]]
-* [[Ashers (Technics PEII]]
+*[[Ashers (Technics PEII]]
-* [[Unaxis VLR ICP-Etch]]
+*[[Unaxis VLR ICP-Etch]]
-|width=400|
+| width="400" |
-* [[ICP Etch 1 (Panasonic E620)]]
-* [[ICP Etch 2 (Panasonic E626)]]
+*[[ICP Etch 1 (Panasonic E620)]]
+*[[ICP Etch 2 (Panasonic E626)]]
-* [[UV Ozone Reactor]]
+*[[UV Ozone Reactor]]
-* [[Plasma Clean (Gasonics 2000)]]
-* [[XeF2 Etch (Xetch)]]
+*[[Plasma Clean (Gasonics 2000)]]
+*[[XeF2 Etch (Xetch)|XeF<sub>2</sub> Etch (Xetch)]]
-* [[Plasma Activation Tool (EVG 810)]]
+*[[Plasma Activation Tool (EVG 810)]]
-* [[HF Vapor Etch]]
+*[[HF Vapor Etch]]
-|-
 |}