Tool List: Difference between revisions
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* [[Probe Station & Curve Tracer]] |
* [[Probe Station & Curve Tracer]] |
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* [[Optical Film Thickness (Filmetrics)]] |
* [[Optical Film Thickness (Filmetrics)]] |
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* [[Optical Film Thickness (Nanometric)]] |
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* [[Scanning Probe Microscope (Veeco NanoMan)]] |
* [[Scanning Probe Microscope (Veeco NanoMan)]] |
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* [[Tencor Flexus Film Stress]] |
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|width=400| |
|width=400| |
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* [[ |
* [[Tencor Flexus Film Stress]] |
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* [[SEM Sample Coater (Hummer)]] |
* [[SEM Sample Coater (Hummer)]] |
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* [[Surface Analysis (KLA/Tencor Surfscan)]] |
* [[Surface Analysis (KLA/Tencor Surfscan)]] |
Revision as of 16:54, 1 July 2012
Lithography
Vacuum Deposition
Dry Etch
Wet Processing
Thermal Processing
- Rapid Thermal Processor (AET RX6)
- Strip Annealer
- Tube Furnace (Tystar 8300)
- Tube Furnace Wafer Bonding (Thermco)
- Tube Furnace AlGaAs Oxidation (Linberg)