Tool List: Difference between revisions

From UCSB Nanofab Wiki
Jump to navigation Jump to search
Line 63: Line 63:


| width="400" |
| width="400" |
*[[ICP Etch 1 (Panasonic E620)]]
*[[ICP Etch 1 (Panasonic E626I)]]
*[[ICP Etch 2 (Panasonic E626)]]
*[[ICP Etch 2 (Panasonic E640)]]
*[[UV Ozone Reactor]]
*[[UV Ozone Reactor]]
*[[Plasma Clean (Gasonics 2000)]]
*[[Plasma Clean (Gasonics 2000)]]

Revision as of 19:13, 9 July 2012

Lithography

Vacuum Deposition

Dry Etch

Wet Processing

Thermal Processing

Packaging

Inspection, Test and Characterization