Tool List: Difference between revisions

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* [[Optical Film Thickness (Filmetrics)]]
* [[Optical Film Thickness (Filmetrics)]]
* [[Optical Film Thickness (Nanometric)]]
* [[Optical Film Thickness (Nanometric)]]
* [[Goniometer]]
* [[Atomic Force Microsope (Dimension 3100/Nanoscope IVA)]]
|width=400|
|width=400|
* [[Tencor Flexus Film Stress]]
* [[Tencor Flexus Film Stress]]
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* [[Photo-emission & IR Microscope (QFI)]]
* [[Photo-emission & IR Microscope (QFI)]]
* [[Ellipsometer (Woollam)]]
* [[Ellipsometer (Woollam)]]
* [[Goniometer]]
* [[4-Point Probe Resistivity Mapper]]
* [[4-Point Probe Resistivity Mapper]]
* [[Laser Scanning Confocal M-scope (Olympus LEXT)]]
* [[Laser Scanning Confocal M-scope (Olympus LEXT)]]
* [[Deep UV Optical Microscope (Olympus)]]
* [[Deep UV Optical Microscope (Olympus)]]
* [[Atomic Force Microsope (Dimension 3100/Nanoscope IVA)]]
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Revision as of 02:27, 11 July 2012

Lithography

Vacuum Deposition

Dry Etch

Wet Processing

Thermal Processing

Packaging

Inspection, Test and Characterization