Tool List: Difference between revisions
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* [[Ion Beam Deposition (Veeco NEXUS)]] |
* [[Ion Beam Deposition (Veeco NEXUS)]] |
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* [[Molecular Vapor Deposition]] |
* [[Molecular Vapor Deposition]] |
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* [[Atomic Layer Deposision (Oxford |
* [[Atomic Layer Deposision (Oxford FlexAL)]] |
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Revision as of 23:28, 30 June 2012
Lithography
Vacuum Deposition
Dry Etch
Wet Processing
Thermal Processing
- Rapid Thermal Processor (AET RX6)
- Strip Annealer
- Tube Furnace (Tystar 8300)
- Tube Furnace Wafer Bonding (Thermco)
- Tube Furnace AlGaAs Oxidation (Linberg)