Tool List: Difference between revisions
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*[[PECVD 2 (Advanced Vacuum)]] |
*[[PECVD 2 (Advanced Vacuum)]] |
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*[[Thermal Evap 1]] |
*[[Thermal Evap 1]] |
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*[[Thermal Evap 2]] |
*[[Thermal Evap 2 (Solder)]] |
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*[[Unaxis VLR ICP-PECVD]] |
*[[Unaxis VLR ICP-PECVD]] |
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*[[Ion Beam Deposition (Veeco NEXUS)]] |
*[[Ion Beam Deposition (Veeco NEXUS)]] |
Revision as of 20:00, 10 July 2012
Lithography
Vacuum Deposition
Dry Etch
Wet Processing
Thermal Processing
- Rapid Thermal Processor (AET RX6)
- Strip Annealer
- Tube Furnace (Tystar 8300)
- Tube Furnace Wafer Bonding (Thermco)
- Tube Furnace AlGaAs Oxidation (Linberg)