Tool List: Difference between revisions
Jump to navigation
Jump to search
Line 17: | Line 17: | ||
* [[Stepper 3 (ASML)]] |
* [[Stepper 3 (ASML)]] |
||
* [[E-Beam Lithography System (JEOL JBX-6300FS)]] |
* [[E-Beam Lithography System (JEOL JBX-6300FS)]] |
||
* [[AFM-based Nanolithography Tool (NanoMan)]] |
|||
* [[Nano-Imprint Tool (Nanonex NX2000)]] |
* [[Nano-Imprint Tool (Nanonex NX2000)]] |
||
* [[Contact Aligner (SUSS MA-6)]] |
* [[Contact Aligner (SUSS MA-6)]] |
Revision as of 16:41, 10 July 2012
Lithography
Vacuum Deposition
Dry Etch
Wet Processing
Thermal Processing
- Rapid Thermal Processor (AET RX6)
- Strip Annealer
- Tube Furnace (Tystar 8300)
- Tube Furnace Wafer Bonding (Thermco)
- Tube Furnace AlGaAs Oxidation (Linberg)