Tool List

Lithography

Suss Aligners (SUSS MJB-3) IR Aligner (SUSS MJB-3 IR) DUV Flood Expose Ovens 1, 2 & 3 (Labline) Oven 4 (Fisher) Oven 5 (Blue M) Vacuum Oven (YES) Holographic Lith/PL Setup

Stepper 1 (GCA 6300) Stepper 2 (AutoStep 200) Stepper 3 (ASML) E-Beam Lithography System (JEOL JBX-6300FS) AFM-based Nanolithography Tool (NanoMan) Nano-Imprint Tool (Nanonex NX2000) Contact Aligner (SUSS MA-6) Wafer Bonder (SUSS SB6-8E)

Vacuum Deposition

E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2 (SFI Endeavor) Sputter 3 (AJA) Sputter 4 (AJA) Sputter 5 (Lesker AXXIS)

PECVD 1 (PlasmTherm 790) PECVD 2 (Advanced Vacuum) Thermal Evap 1 Thermal Evap 2 Unaxis VLR ICP-PECVD Ion Beam Deposition (Veeco NEXUS) Molecular Vapor Deposition Atomic Layer Deposision (Oxford Flexal)

Dry Etch

RIE 1 (Custom) RIE 2 (MRC) RIE 3 (MRC) RIE 5 (PlasmaTherm SLR) Si Deep RIE (Bosch Etch) Ashers (Technics PEII Unaxis VLR ICP-Etch

ICP Etch 1 (Panasonic E620) ICP Etch 2 (Panasonic E626) UV Ozone Reactor Plasma Clean (Gasonics 2000) XeF2 Etch (Xetch) Plasma Activation Tool (EVG 810) HF Vapor Etch

Wet Processing

Gold Plating Bench Critical Point Dryer Spin Rinse Dryer (SemiTool) Scales Wet Etch Wafer Scale Solvent Processing Wafer Scale

Chemical-Mechanical Polisher (Logitech) Wet Benches Photoresist Spin Benches Lithography Development & Solvent Clean Benches Wet Etch Benches

Thermal Processing

• Rapid Thermal Processor (AET RX6)
• Strip Annealer
• Tube Furnace (Tystar 8300)
• Tube Furnace Wafer Bonding (Thermco)
• Tube Furnace AlGaAs Oxidation (Linberg)

Packaging

• Flip-Chip Bonder (Finetech)
• Vacuum Sealer
• Dicing Saw (ADT)
• Wire Saw (Takatori)

Inspection, Test and Characterization

Field Emission SEM 1 (FEI Sirion) Field Emission SEM 2 (JEOL 7600F Step Profile (Dektak IIA) Step Profilometer (Dektak 6M) Ellipsometer (Rudolph) Microscopes Probe Station & Curve Tracer Optical Film Thickness (Filmetrics) Scanning Probe Microscope (Veeco NanoMan) Tencor Flexus Film Stress

Optical Film Thickness (Nanometric) SEM Sample Coater (Hummer) Surface Analysis (KLA/Tencor Surfscan) Photo-emission & IR Microscope (QFI) Ellipsometer (Woollam) Goniometer 4-Point Probe Resistivity Mapper Laser Scanning Confocal M-scope (Olympus LEXT) Deep UV Optical Microscope (Olympus)