Tool List: Difference between revisions
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*[[RIE 3 (MRC)]] |
*[[RIE 3 (MRC)]] |
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*[[RIE 5 (PlasmaTherm)]] |
*[[RIE 5 (PlasmaTherm)]] |
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*[[Si Deep RIE (Bosch Etch)]] |
*[[Si Deep RIE (PlasmaTherm/Bosch Etch)]] |
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*[[Ashers (Technics PEII)]] |
*[[Ashers (Technics PEII)]] |
||
*[[Unaxis VLR ICP-Etch]] |
*[[Unaxis VLR ICP-Etch]] |
Revision as of 13:46, 11 July 2012
Lithography
Vacuum Deposition
Dry Etch
Wet Processing
Thermal Processing
- Rapid Thermal Processor (AET RX6)
- Strip Annealer
- Tube Furnace (Tystar 8300)
- Tube Furnace Wafer Bonding (Thermco)
- Tube Furnace AlGaAs Oxidation (Linberg)