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The following pages do not link to other pages in UCSB Nanofab Wiki.
Showing below up to 111 results in range #1 to #111.
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- ADT 7100 - Initial Setup Before Cutting
- ADT 7100 - Recovering an Old Recipe (2019)
- ADT UV-Tape Table 1042R
- ASML 5500: Choose Marks for Prealignment
- ASML 5500: Recovering from a Typo in Reticle ID
- ASML Stepper 3: Wafer Handler Reset Procedure
- ASML Stepper 3 - Substrates smaller than 100mm/4-inch
- AUTOSTEP 200-PIECES 1st litho BL and BR orientation.pptx
- Adam Abrahamsen
- Autostep 200 Old training manual
- Autostep 200 User Accessible Commands
- CC-PRIME OnBoarding 2022-08
- CDE ResMap Quick-Start instructions
- Chemical List - OLD 2018-09-05
- Claudia Gutierrez
- Comparison of ash rate for different gas mixtures, especially between O2 only vs O2/N2 mixture.
- DS-K101-304 Bake Temp. versus Develop Rate
- Electronics Presentations
- Ellipsometer (Woollam) - Measuring thin metals with oxide pre-measurement
- Errors
- Filmetrics F10-RT-UVX Operating Procedure
- Foong Fatt
- GCA 6300 Reboot Procedures
- GCA 6300 USer Accessible Commands
- GCA 6300 training manual -old instructions
- Glossary
- Gold surface oxidation (darkening) due to O2/N2 plasma; the need for O2 only recipe.
- Goniometer (Rame-Hart A-100) - Operating Procedure
- InP Etch Rate and Selectivity (InP/SiO2)
- InP Etch Test-in details
- InP Etch Test Result in Details
- InP Etch test -details
- InP etch result in details
- Jack Whaley
- KLA Tencor P7 - Basic profile instructions
- KLA Tencor P7 - Saving Profile Data
- Lab Rules OLD 2018
- MA6 Backside Alignment - Allowed Mark Locations
- Michael Barreraz
- Mike Silva
- Nanofab-IT - Add Device to Network
- Old Training Manual
- Old training manual
- Olympus LEXT OLS4000 Confocal uScope - Quick Start
- Oxford Etcher - Sample Size Effect on Etch Rate
- PECVD.docx
- PECVD1-(PlasmaTherm 790)
- PECVD1-SiN-standard recipe.pdf
- PECVD1-SiN standard recipe.pdf
- PECVD1 Operating Instructions.pdf
- PECVD1 Wafer Coating Process Traveler
- Peder Lenvik
- Photonics Presentations
- Probe Station: I-V Curves with Keithley 2400 and Python Script
- ProcessGroup: Shipping Samples on Dicing Tape+Frame
- Process Group - Billing Instructions
- Process Group - Lab Stocking/Supplies Tasks
- Process Group - Remote Fabrication Jobs
- Programming a Job
- PubList2018
- Publications - 2013-2014
- RIE5 - Standard Operating procedure (Cortex Software)
- SPR220-7 at 3kW various temperature without N2 gas
- STD SiO2 recipe
- SiN 100C Table-2019
- SiO2 Etching Test using CF4/CHF3
- Sputter 5
- Stepper 1 (GCA6300) How to select proper chuck
- Stepper 1 (GCA 6300) Available chucks
- Stepper 1 (GCA 6300) Substrate Thickness, Shim Thickness ans Target Thickness
- Stepper 2 (AutoStep 200) - Operating Procedure - Piece Parts
- Stepper 2 (Autostep 200) - Chuck Selection
- Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences
- Stepper 2 (Autostep 200) - Table of Chucks, Shims, Target Thicknesses
- Stocked Chemical List
- Surfscan6200 photos
- Surfscan Errors and Workarounds
- Surfscan photo
- Suss MA-6 Backside Alignment QuickStart
- TEST PAGE
- THz Physics Presentations
- Tech Talks Seminar Series
- Test Data of Etching SiO2 with CHF3/CF4-Florine ICP Etcher
- Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher
- Test Data of etching SiO2 with CHF3/CF4-Florine
- Test Data of etching SiO2 with CHF3/CF4-Florine ICP Etcher
- Test Data of etching SiO2 with CHF3/CF4-ICP1
- Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer)
- Test Page
- Tino Sy
- Tom Reynolds
- Troubleshooting and Recovery
- UCSBTEST1Gain4.jpg
- UV Ozone Quick Start
- Unaxis SOP 3-12-2020.docx
- Unaxis SiN100C 300nm-2019
- Unaxis Test Recipe Page
- Usage Data and Statistics
- User Accessible Commands
- Video Training: Hosting with Zoom and GacuhoCast/Panopto
- Vraj Mehalana
- Wafer Cleaver Recipes (LSD-155LT)
- Wafer Coating Process Traveler
- Wafer Coating Process Traveler1
- Wafer Scanning/Coating Process Traveler ( combined/less detailed)
- Wafer Scanning process Traveler
- Wafer coating procedure
- YES-150C-Various-Resists
- YES-SPR220-Various-Temps
- YES Recipe Screenshots: STD-N2-O2
- YES Recipe Screenshots: STD-O2