Tool List: Difference between revisions
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* [[Sputter 1 (Custom)]] |
* [[Sputter 1 (Custom)]] |
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* [[Sputter 2 (SFI Endeavor)]] |
* [[Sputter 2 (SFI Endeavor)]] |
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* [[Sputter 3 (AJA)]] |
* [[Sputter 3 (AJA 2000-F)]] |
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* [[Sputter 4 (AJA)]] |
* [[Sputter 4 (AJA 2200-V)]] |
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* [[Sputter 5 (Lesker AXXIS)]] |
* [[Sputter 5 (Lesker AXXIS)]] |
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Revision as of 19:13, 9 July 2012
Lithography
Vacuum Deposition
Dry Etch
Wet Processing
Thermal Processing
- Rapid Thermal Processor (AET RX6)
- Strip Annealer
- Tube Furnace (Tystar 8300)
- Tube Furnace Wafer Bonding (Thermco)
- Tube Furnace AlGaAs Oxidation (Linberg)