Tool List: Difference between revisions

From UCSB Nanofab Wiki
Jump to navigation Jump to search
Line 15: Line 15:
* [[Stepper 1 (GCA 6300)]]
* [[Stepper 1 (GCA 6300)]]
* [[Stepper 2 (AutoStep 200)]]
* [[Stepper 2 (AutoStep 200)]]
* [[Stepper 3 (ASML)]]
* [[Stepper 3 (ASML DUV)]]
* [[E-Beam Lithography System (JEOL JBX-6300FS)]]
* [[E-Beam Lithography System (JEOL JBX-6300FS)]]
* [[Nano-Imprint (Nanonex NX2000)]]
* [[Nano-Imprint (Nanonex NX2000)]]

Revision as of 14:00, 11 July 2012

Lithography

Vacuum Deposition

Dry Etch

Wet Processing

Thermal Processing

Packaging

Inspection, Test and Characterization