Tool List

Lithography

Photoresists and Lithography Chemicals See the Chemical Datasheets page. Auto. Coat/Develop (S-Cubed Flexi) Contact Aligners (Optical Exposure) Suss Aligners (SUSS MJB-3) IR Aligner (SUSS MJB-3 IR) Contact Aligner (SUSS MA-6) DUV Flood Expose Other Patterning Systems E-Beam Lithography System (JEOL JBX-6300FS) Nano-Imprint (Nanonex NX2000) Holographic Litho/PL Setup (Custom)

Steppers (Optical Exposure) Stepper 1 (GCA 6300, i-line) Stepper 2 (AutoStep 200, i-line) Stepper 3 (ASML DUV, Deep-UV) Thermal Processing for Photolithography Ovens - Overview of all lab ovens Ovens 1, 2 & 3 (Labline) Oven 4 (Fisher) Oven 5 (Labline) High Temp Oven (Blue M) Vacuum Oven (YES) Lithography Support The Spinner Benches have pre-set hotplates at various temperatures appropriate for common photoresist bakes. POLOS spinners on Develop and Solvent benches Spin/Rinse/Dryer

Vacuum Deposition

Physical Vapor Deposition (PVD) E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Thermal Evap 1 Thermal Evap 2 (Solder) Sputter Deposition Sputter 3 (AJA ATC 2000-F) Sputter 4 (AJA ATC 2200-V) Sputter 5 (AJA ATC 2200-V) Ion Beam Deposition (Veeco NEXUS)

Chemical Vapor Deposition (CVD) PECVD 1 (PlasmaTherm 790) PECVD 2 (Advanced Vacuum) ICP-PECVD (Unaxis VLR) Molecular Vapor Deposition Atomic Layer Deposition (Oxford FlexAL)

Dry Etch

Reactive Ion Etching (RIE) RIE 2 (MRC) RIE 3 (MRC) RIE 5 (PlasmaTherm) Ashers (Technics PEII) Plasma Clean (Gasonics 2000) Plasma Clean (YES EcoClean) Plasma Activation (EVG 810) CAIBE (Oxford Ion Mill) Etch Monitoring Laser Etch Monitoring (Endpoint Detection) Optical Emission Spectra Residual Gas Analyzer (RGA)

ICP-RIE ICP Etch 1 (Panasonic E626I) ICP Etch 2 (Panasonic E640) ICP-Etch (Unaxis VLR) Plasma-Therm SLR: Fluorine ICP (PlasmaTherm/SLR Fluorine Etcher) Plasma-Therm DSE-iii (PlasmaTherm/Deep Silicon Etcher) Other Dry Etching UV Ozone Reactor XeF2 Etch (Xetch) Vapor HF Etch

Wet Processing

See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.

Wet Benches Solvent Cleaning Benches Spin Coat Benches Develop Benches Toxic Corrosive Benches HF/TMAH Processing Benches Plating Bench

Gold Plating Bench Critical Point Dryer Spin Rinse Dryer (SemiTool) Chemical-Mechanical Polisher (Logitech) Auto. Coat/Develop (S-Cubed Flexi) Auto. Wet-Processing Spinners (POLOS)

Thermal Processing

Rapid Thermal Annealer/Processor "RTA" (AET RX6) Rapid Thermal Processor (SSI Solaris 150) Tube Furnace (Tystar 8300) Tube Furnace Wafer Bonding (Thermco) Tube Furnace AlGaAs Oxidation (Lindberg) Wafer Bonder (SUSS SB6-8E) Wafer Bonder/Wax Mounting (Logitech WBS2)

Ovens - Overview of all Lab Ovens Ovens 1, 2 & 3 (Labline) Oven 4 (Thermo-Fisher HeraTherm) Oven 5 (Labline) Vacuum Oven (YES) High Temp Oven (Blue M)

Packaging

• Dicing Saw (ADT)
• Flip-Chip Bonder (Finetech)
• Vacuum Sealer
• Wire Saw (Takatori)

Inspection, Test and Characterization

Optical/Electron Microscopy Optical Microscopes Fluorescence Microscope (Olympus MX51) Deep UV Optical Microscope (Olympus) Laser Scanning Confocal M-scope (Olympus LEXT) Photo-emission & Thermal IR Microscope (QFI) Field Emission SEM 1 (FEI Sirion) Field Emission SEM 2 (JEOL 7600F) SEM Sample Coater (Hummer) Topographical Metrology Step Profilometer (KLA Tencor P-7) Step Profilometer (Dektak 6M) Atomic Force Microsope (Bruker ICON) Surface Analysis (KLA/Tencor Surfscan) Sub-micron Particle Counter Laser Scanning Confocal M-scope (Olympus LEXT) Optical Profilometer - White-Light/Phase-Shift Interference (Filmetrics Profilm3D)

Thin-Film Analysis/Measurement Ellipsometer (Woollam) Film Stress (Tencor Flexus) Optical Film Thickness (Microscope-Mounted Filmetrics F-40-UV) Optical Film Thickness (Filmetrics F20) Optical Film Thickness & Wafer-Mapping (Filmetrics F50) Reflection/Transmission Spectra & Optical Film Thickness (Filmetrics F10-RT-UVX) Optical Film Thickness (Nanometric) Resistivity Mapper (CDE RESMAP) Other Tools Probe Station & Curve Tracer Goniometer Photoluminescence PL Setup (Custom)