Tool List: Difference between revisions
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*[[E-Beam Lithography System (JEOL JBX-6300FS)]] |
*[[E-Beam Lithography System (JEOL JBX-6300FS)]] |
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*[[ |
*[[SEM 1 (JEOL IT800SHL)|E-Beam Lithography (Nabity v9)]] |
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*[[Focused Ion-Beam Lithography (Raith Velion)]] |
*[[Focused Ion-Beam Lithography (Raith Velion)]] |
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*[[Maskless Aligner (Heidelberg MLA150)]] |
*[[Maskless Aligner (Heidelberg MLA150)]] |
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*[[RIE 2 (MRC)]] |
*[[RIE 2 (MRC)]] |
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*[[RIE 3 (MRC)]] |
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*[[RIE 5 (PlasmaTherm)]] |
*[[RIE 5 (PlasmaTherm)]] |
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*[[ICP Etch 1 (Panasonic E646V)]] |
*[[ICP Etch 1 (Panasonic E646V)]] |
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*[[ICP Etch 2 (Panasonic E626I)]] |
*[[ICP Etch 2 (Panasonic E626I)]] |
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*[[ICP-Etch (Unaxis VLR)]] |
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*[[Oxford ICP Etcher (PlasmaPro 100 Cobra)]] |
*[[Oxford ICP Etcher (PlasmaPro 100 Cobra)]] |
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*[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)| |
*[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|Fluorine ICP (PlasmaTherm/SLR Fluorine Etcher)]] |
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*[[DSEIII (PlasmaTherm/Deep Silicon Etcher)|Plasma-Therm DSE-iii (PlasmaTherm/Deep Silicon Etcher)]] |
*[[DSEIII (PlasmaTherm/Deep Silicon Etcher)|Plasma-Therm DSE-iii (PlasmaTherm/Deep Silicon Etcher)]] |
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*[[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
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*[[Digital Microscope (Olympus DSX1000)|Digital Microscope #7 (Olympus DSX1000)]] |
*[[Digital Microscope (Olympus DSX1000)|Digital Microscope #7 (Olympus DSX1000)]] |
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*[[Suss Aligners (SUSS MJB-3)#Backside Alignment|Near-IR Inspection Scope (MJB-IR)]] |
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=====Electron Microscopy===== |
=====Electron Microscopy===== |
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*[[Surface Analysis (KLA/Tencor Surfscan)|Particle Counts (KLA/Tencor Surfscan)]] |
*[[Surface Analysis (KLA/Tencor Surfscan)|Particle Counts (KLA/Tencor Surfscan)]] |
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*[[Photoluminescence PL Setup (Custom)]] |
*[[Photoluminescence PL Setup (Custom)]] |
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*[[Goniometer (Rame-Hart A-100)|Goniometer (Ramé-Hart A-100)]] |
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**''Surface hydrophobicity'' |
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== [[Decomissioned Tools]] == |
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Click the link above for a list of tools that are no longer available in the lab, but the data is retained for legacy purposes. |
Latest revision as of 22:28, 6 August 2024
Lithography
Photoresists and Lithography ChemicalsContact Aligners (Optical Exposure)Direct-Write Lithography
Other Patterning Systems |
Steppers (Optical Exposure)Thermal Processing for Photolithography
Lithography Support
|
Vacuum Deposition
Physical Vapor Deposition (PVD)Thermal Evaporation
Sputter Deposition |
Chemical Vapor Deposition (CVD) |
Dry Etch
Reactive Ion Etching (RIE)Plasma Etching and CleaningEtch Monitoring
|
ICP-RIE
Ion Milling and Reactive Ion Beam EtchingOther Dry Etching |
Wet Processing
See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.
Thermal Processing
Packaging
Back-end Fabrication Tools
Die Singulation / Down-sizingOther Packaging |
Wafer/Die Bonding |
Measurement & Characterization
Metrology, Electrical/Optical Testing and Thin-Film/Materials Characterization tools
Optical Microscopy
Electron MicroscopyTopographical Metrology |
Thin-Film/Material AnalysisThickness + Optical Constants
Electrical Analysis
Other Properties |
Decomissioned Tools
Click the link above for a list of tools that are no longer available in the lab, but the data is retained for legacy purposes.