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  1. Filmetrics F50 - Operating Procedure‏‎ (1 revision)
  2. Publications - 2013-2014‏‎ (1 revision)
  3. Sputter 5‏‎ (1 revision)
  4. Flood Exposure Recipes‏‎ (1 revision)
  5. ProcessGroup: Shipping Samples on Dicing Tape+Frame‏‎ (1 revision)
  6. Nanofab-IT - Add Device to Network‏‎ (1 revision)
  7. Equipment Group - Video Training Procedures‏‎ (1 revision)
  8. Ellipsometer (Woollam) - Measuring thin dielectrics with Native Oxide pre-measurement‏‎ (1 revision)
  9. Stepper 1 (GCA 6300) Available chucks‏‎ (1 revision)
  10. GCA 6300 Stepper Training MAnual-Full version‏‎ (1 revision)
  11. Intellemetrics Laser Etch Monitor Procedure for Plasma-Therm Etchers‏‎ (1 revision)
  12. Plasma Clean (Gasonics 2000)‏‎ (1 revision)
  13. ASML Stepper 3 - Job Creator‏‎ (1 revision)
  14. InP Etch test -details‏‎ (1 revision)
  15. InP Etch Test-in details‏‎ (1 revision)
  16. TEST PAGE‏‎ (1 revision)
  17. Photomask Ordering Procedure for UCSB Users‏‎ (1 revision)
  18. Homepage Draft1‏‎ (1 revision)
  19. RIE5 - Standard Operating procedure (Cortex Software)‏‎ (1 revision)
  20. Stepper 2 (AutoStep 200) - Operating Procedure - Piece Parts‏‎ (1 revision)
  21. AUTOSTEP 200-PIECES 1st litho BL and BR orientation.pptx‏‎ (1 revision)
  22. Hummer SEM Sample Coater - Techniques to reduce charging in SEMs‏‎ (1 revision)
  23. PECVD.docx‏‎ (1 revision)
  24. Operating Instructions‏‎ (1 revision)
  25. Stepper 1 (GCA 6300) Substrate Thickness, Shim Thickness ans Target Thickness‏‎ (1 revision)
  26. Older Publications‏‎ (1 revision)
  27. Advanced PECVD Recipes‏‎ (1 revision)
  28. PECVD1 Operating Instructions.pdf‏‎ (1 revision)
  29. Video Training - Introduction (Internal)‏‎ (1 revision)
  30. Wafer coating procedure‏‎ (1 revision)
  31. Comparison of ash rate for different gas mixtures, especially between O2 only vs O2/N2 mixture.‏‎ (1 revision)
  32. Wafer Cleaver Recipes (LSD-155LT)‏‎ (1 revision)
  33. UCSBTEST1Gain4.jpg‏‎ (1 revision)
  34. STD SiO2 recipe‏‎ (1 revision)
  35. LegacyTable‏‎ (1 revision)
  36. ASML Stepper 3 - Substrates smaller than 100mm/4-inch‏‎ (1 revision)
  37. AUTOSTEP 200-PIECES instruction 6-20-19.pptx‏‎ (1 revision)
  38. MA6 Backside Alignment - Allowed Mark Locations‏‎ (1 revision)
  39. Lab Rules backup‏‎ (1 revision)
  40. UV Ozone Quick Start‏‎ (1 revision)
  41. Unaxis SOP 3-12-2020.docx‏‎ (1 revision)
  42. Stepper 1 (GCA6300) How to select proper chuck‏‎ (1 revision)
  43. PECVD1-SiN-standard recipe.pdf‏‎ (1 revision)
  44. Unaxis Test Recipe Page‏‎ (1 revision)
  45. SiN 100C Table-2019‏‎ (1 revision)
  46. Oxford Etcher - Sample Size Effect on Etch Rate‏‎ (1 revision)
  47. Critical Point Dryer‏‎ (2 revisions)
  48. Thermal Evaporator 2‏‎ (2 revisions)
  49. Michael Barreraz‏‎ (2 revisions)
  50. Exposing a wafer piece‏‎ (2 revisions)
  51. SPR220-7 at 3kW various temperature without N2 gas‏‎ (2 revisions)
  52. News Feed‏‎ (2 revisions)
  53. Unaxis SiN100C 300nm-2019‏‎ (2 revisions)
  54. Surfscan6200 photos‏‎ (2 revisions)
  55. Autostep 200 Old training manual‏‎ (2 revisions)
  56. ASML Stepper 3: Wafer Handler Reset Procedure‏‎ (2 revisions)
  57. Errors‏‎ (2 revisions)
  58. SiO2 Etching Test using CF4/CHF3‏‎ (2 revisions)
  59. ASML 5500: Choose Marks for Prealignment‏‎ (2 revisions)
  60. E-Beam 5 (Plasys)‏‎ (2 revisions)
  61. CDE ResMap Quick-Start instructions‏‎ (2 revisions)
  62. SSI Solaris 150 - Operating Procedure‏‎ (2 revisions)
  63. Main Page mod‏‎ (2 revisions)
  64. Stepper 2 (Autostep 200) - Table of Chucks, Shims, Target Thicknesses‏‎ (2 revisions)
  65. ADT 7100 - Recovering an Old Recipe (2019)‏‎ (2 revisions)
  66. Stepper 2 (Autostep 200) - Chuck Selection‏‎ (2 revisions)
  67. Strip Annealer‏‎ (2 revisions)
  68. Ellipsometer (Woollam) - Measuring thin metals with oxide pre-measurement‏‎ (2 revisions)
  69. Test Data of etching SiO2 with CHF3/CF4/O2‏‎ (2 revisions)
  70. Test Page‏‎ (2 revisions)
  71. PECVD1-SIN Standard Recipe (PlasmaTherm 790)‏‎ (2 revisions)
  72. Molecular Vapor Deposition Recipes‏‎ (2 revisions)
  73. THz Physics Presentations‏‎ (2 revisions)
  74. GCA 6300 training manual -old instructions‏‎ (2 revisions)
  75. E-Beam Lithography Recipes‏‎ (2 revisions)
  76. Video Training: Uploading to GauchoCast/Panopto (Internal)‏‎ (2 revisions)
  77. Surfscan photo‏‎ (2 revisions)
  78. Process Group - Lab Stocking/Supplies Tasks‏‎ (2 revisions)
  79. Wire Saw (Takatori)‏‎ (3 revisions)
  80. Photolithography - Improving Adhesion Photoresist Adhesion‏‎ (3 revisions)
  81. MLA Recipes‏‎ (3 revisions)
  82. Vacuum Oven (YES)‏‎ (3 revisions)
  83. ASML 5500: Recovering from a Typo in Reticle ID‏‎ (3 revisions)
  84. Mike Day‏‎ (3 revisions)
  85. Gold Plating Bench‏‎ (3 revisions)
  86. Vapor HF Etch (uETCH)‏‎ (3 revisions)
  87. Foong Fatt‏‎ (3 revisions)
  88. Glossary‏‎ (3 revisions)
  89. Sputter 1 (Custom)‏‎ (3 revisions)
  90. MVD - Wafer Coating - Process Traveler‏‎ (3 revisions)
  91. Nanofab Job Postings‏‎ (3 revisions)
  92. Nick test‏‎ (3 revisions)
  93. Video Training: Hosting with Zoom and GacuhoCast/Panopto‏‎ (3 revisions)
  94. Vacuum Sealer‏‎ (3 revisions)
  95. User Accessible Commands‏‎ (3 revisions)
  96. ADT UV-Tape Table 1042R‏‎ (3 revisions)
  97. Logitech WBS7 - Procedure for Wax Mounting with Spin-On Crystalbond‏‎ (3 revisions)
  98. Ellipsometer (Rudolph)‏‎ (3 revisions)
  99. SEM 1 (JEOL IT800SHL)‏‎ (3 revisions)
  100. PECVD1-SiN standard recipe.pdf‏‎ (3 revisions)
  101. Test Data of Etching SiO2 with CHF3/CF4-Florine ICP Etcher‏‎ (3 revisions)
  102. ASML Stepper 3 Dicing Guide Programming‏‎ (3 revisions)
  103. Test Data of etching SiO2 with CHF3/CF4-Florine ICP Etcher‏‎ (3 revisions)
  104. DS-K101-304 Bake Temp. versus Develop Rate‏‎ (3 revisions)
  105. Gold surface oxidation (darkening) due to O2/N2 plasma; the need for O2 only recipe.‏‎ (3 revisions)
  106. MLA150 - Large Image GDS Generation‏‎ (4 revisions)
  107. Filmetrics F10-RT-UVX Operating Procedure‏‎ (4 revisions)
  108. Laser Etch Monitor Simulation in Python‏‎ (4 revisions)
  109. Wafer Scanning process Traveler‏‎ (4 revisions)
  110. Jack Whaley‏‎ (4 revisions)
  111. Test Data of etching SiO2 with CHF3/CF4-Florine‏‎ (4 revisions)
  112. Peder Lenvik‏‎ (4 revisions)
  113. Claudia Gutierrez‏‎ (4 revisions)
  114. GCA 6300 Reboot Procedures‏‎ (4 revisions)
  115. Tube Furnace AlGaAs Oxidation (Lindberg)‏‎ (4 revisions)
  116. Electronics Presentations‏‎ (4 revisions)
  117. KLA Tencor P7 - Basic profile instructions‏‎ (4 revisions)
  118. Suss MA-6 Backside Alignment QuickStart‏‎ (4 revisions)
  119. ASML DUV: Edge Bead Removal via Photolithography‏‎ (4 revisions)
  120. Step Profile (Dektak IIA)‏‎ (4 revisions)
  121. Vraj Mehalana‏‎ (4 revisions)
  122. Tube Furnace Wafer Bonding (Thermco)‏‎ (5 revisions)
  123. Lift-Off with I-Line Imaging Resist + LOL2000 Underlayer‏‎ (5 revisions)
  124. Tino Sy‏‎ (5 revisions)
  125. Thermal Evaporator 1‏‎ (5 revisions)
  126. Old Training Manual‏‎ (5 revisions)
  127. Automated Wafer Cleaver (Loomis LSD-155LT)‏‎ (5 revisions)
  128. Spin Rinse Dryer (SemiTool)‏‎ (5 revisions)
  129. Mechanical Polisher (Allied)‏‎ (5 revisions)
  130. Old Deposition Data - 2021-12-15‏‎ (5 revisions)
  131. MLA150 - CAD Files and Templates‏‎ (5 revisions)
  132. Goniometer (Rame-Hart A-100) - Operating Procedure‏‎ (5 revisions)
  133. PubList2018‏‎ (5 revisions)
  134. Sputter 2 (SFI Endeavor)‏‎ (5 revisions)
  135. E-BEAM‏‎ (6 revisions)
  136. Resistivity Mapper (CDE RESMAP)‏‎ (6 revisions)
  137. Wafer Cleaver (PELCO Flip-Scribe)‏‎ (6 revisions)
  138. Luis Zuzunaga‏‎ (6 revisions)
  139. Digital Microscope (Olympus DSX1000)‏‎ (6 revisions)
  140. Olympus LEXT OLS4000 Confocal uScope - Quick Start‏‎ (6 revisions)
  141. Photonics Presentations‏‎ (6 revisions)
  142. S-Cubed Flexi - Operating Procedure‏‎ (6 revisions)
  143. Photoluminescence PL Setup (Custom)‏‎ (6 revisions)
  144. Optical Film Thickness (Filmetrics)‏‎ (6 revisions)
  145. GCA Old full training manual‏‎ (7 revisions)
  146. Optical Film Thickness & Wafer-Mapping (Filmetrics F50)‏‎ (7 revisions)
  147. Probe Station: I-V Curves with Keithley 2400 and Python Script‏‎ (7 revisions)
  148. Holographic Lith/PL Setup (Custom)‏‎ (7 revisions)
  149. Deposition Data - temporary 2021-12-15‏‎ (7 revisions)
  150. High Temp Oven (Blue M)‏‎ (7 revisions)
  151. ADT 7100 - Initial Setup Before Cutting‏‎ (7 revisions)
  152. Amscope Quickstart Usage Guide‏‎ (7 revisions)
  153. Programming a Job‏‎ (7 revisions)
  154. Flip-Chip Bonder (Finetech)‏‎ (7 revisions)
  155. Dan Read‏‎ (7 revisions)
  156. RIE 1 (Custom)‏‎ (7 revisions)
  157. PECV1 Wafer Coating Process Traveler‏‎ (7 revisions)
  158. Wafer Scanning/Coating Process Traveler ( combined/less detailed)‏‎ (7 revisions)
  159. Ovens 1, 2 & 3 (Labline)‏‎ (7 revisions)
  160. Stocked Chemical List‏‎ (7 revisions)
  161. Optical Film Spectra + Optical Properties (Filmetrics F10-RT-UVX)‏‎ (7 revisions)
  162. PECVD1-(PlasmaTherm 790)‏‎ (7 revisions)
  163. Bill Millerski‏‎ (7 revisions)
  164. NanoFab Process Group‏‎ (7 revisions)
  165. Autostep 200 User Accessible Commands‏‎ (7 revisions)
  166. Profilm3D - Quick Start - Surface Roughness Measurement (PSI Mode)‏‎ (8 revisions)
  167. FIJI - Microscope Measurement Tools‏‎ (8 revisions)
  168. SEM Sample Coater (Hummer)‏‎ (8 revisions)
  169. Filmetrics F40-UV Quick Start‏‎ (8 revisions)
  170. ASML 5500: Recovering from an Error‏‎ (8 revisions)
  171. Focused Ion-Beam Lithography (Raith Velion)‏‎ (8 revisions)
  172. Oven 4 (Thermo-Fisher HeraTherm)‏‎ (9 revisions)
  173. Nano-Imprint (Nanonex NX2000)‏‎ (9 revisions)
  174. GCA 6300 Mask Making Guidance‏‎ (9 revisions)
  175. Step Profilometer (KLA Tencor P-7)‏‎ (9 revisions)
  176. Bill Mitchell‏‎ (9 revisions)
  177. Photolithography - Manual Edge-Bead Removal Techniques‏‎ (9 revisions)
  178. YES-150C-Various-Resists‏‎ (9 revisions)
  179. KLA Tencor P7 - Saving Profile Data‏‎ (9 revisions)
  180. Optical Film Thickness (Nanometric)‏‎ (9 revisions)
  181. IBD: Calibrating Optical Thickness‏‎ (9 revisions)
  182. Ashers (Technics PEII)‏‎ (9 revisions)
  183. KLA-Tencor Surfscan - Standard Operating Procedure‏‎ (9 revisions)
  184. Process Group - Billing Instructions‏‎ (9 revisions)
  185. Old Deposition Data - NastaziaM 2021-11-22‏‎ (9 revisions)
  186. Fluorescence Microscope (Olympus MX51)‏‎ (9 revisions)
  187. KLayout Design Tips‏‎ (10 revisions)
  188. Wafer Coating Process Traveler1‏‎ (10 revisions)
  189. Intellemetrics Laser Etch Monitor Procedure for Panasonic ICP Etchers‏‎ (10 revisions)
  190. Ning Cao‏‎ (10 revisions)
  191. GCA 6300 USer Accessible Commands‏‎ (10 revisions)
  192. Adam Abrahamsen‏‎ (10 revisions)
  193. Logitech WBS7 - Procedure for Wax Mounting with bulk Crystalbond Stick‏‎ (10 revisions)
  194. Field Emission SEM 2 (JEOL IT800SHL)‏‎ (10 revisions)
  195. CC-PRIME OnBoarding 2022-08‏‎ (10 revisions)
  196. Unaxis wafer coating procedure‏‎ (10 revisions)
  197. InP Etch Test Result in Details‏‎ (10 revisions)
  198. MLA150 - Design Guidelines‏‎ (11 revisions)
  199. IR Aligner (SUSS MJB-3 IR)‏‎ (11 revisions)
  200. UV Ozone Reactor‏‎ (11 revisions)
  201. Deep UV Optical Microscope (Olympus)‏‎ (11 revisions)
  202. Brian Thibeault‏‎ (12 revisions)
  203. Chemical List‏‎ (12 revisions)
  204. Process Group - Remote Fabrication Jobs‏‎ (12 revisions)
  205. Ovens - Overview of All Lab Ovens‏‎ (12 revisions)
  206. YES-SPR220-Various-Temps‏‎ (12 revisions)
  207. Molecular Vapor Deposition‏‎ (12 revisions)
  208. Wafer Bonder (SUSS SB6-8E)‏‎ (12 revisions)
  209. Film Stress (Tencor Flexus)‏‎ (12 revisions)
  210. Chemical-Mechanical Polisher (Logitech)‏‎ (12 revisions)
  211. XeF2 Etch (Xetch)‏‎ (13 revisions)
  212. InP etch result in details‏‎ (13 revisions)
  213. ASML Stepper 3 - UCSB Test Reticles‏‎ (14 revisions)
  214. Laser Etch Monitoring‏‎ (14 revisions)
  215. Main Page‏‎ (14 revisions)
  216. Lee Sawyer‏‎ (14 revisions)
  217. Step Profilometer (DektakXT)‏‎ (14 revisions)
  218. Unaxis VLR Etch - Process Control Data‏‎ (15 revisions)
  219. ASML Stepper 3 Standard Operating Procedure‏‎ (15 revisions)
  220. UNAVAILABLE - Optical Profilometer - White-Light/Phase-Shift Interference (Filmetrics Profilm3D)‏‎ (15 revisions)
  221. DUV Flood Expose‏‎ (15 revisions)
  222. PECVD1 Wafer Coating Process Traveler‏‎ (16 revisions)
  223. Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer)‏‎ (16 revisions)
  224. Plasma Activation (EVG 810)‏‎ (16 revisions)
  225. E-Beam Lithography System (JEOL JBX-6300FS)‏‎ (16 revisions)
  226. Thermal Processing Recipes‏‎ (17 revisions)
  227. Biljana Stamenic‏‎ (17 revisions)
  228. Rapid Thermal Processor (SSI Solaris 150)‏‎ (17 revisions)
  229. Wafer Bonder (Logitech WBS7)‏‎ (17 revisions)
  230. Atomic Force Microscope (Bruker ICON)‏‎ (18 revisions)
  231. Sputter 5 (AJA ATC 2200-V)‏‎ (18 revisions)
  232. UCSB NanoFab Microscope Training‏‎ (18 revisions)
  233. Plasma Clean (YES EcoClean)‏‎ (18 revisions)
  234. Laser Scanning Confocal M-scope (Olympus LEXT)‏‎ (18 revisions)
  235. Process Group - Process Control Data‏‎ (18 revisions)
  236. Troubleshooting and Recovery‏‎ (19 revisions)
  237. Tech Talks Seminar Series‏‎ (19 revisions)
  238. Probe Station & Curve Tracer‏‎ (19 revisions)
  239. Oxford ICP Etcher (PlasmaPro 100 Cobra)‏‎ (19 revisions)
  240. Automated Coat/Develop System (S-Cubed Flexi)‏‎ (19 revisions)
  241. DSEIII (PlasmaTherm/Deep Silicon Etcher)‏‎ (19 revisions)
  242. Autostep 200 Mask Making Guidance‏‎ (19 revisions)
  243. Lift-Off with DUV Imaging + PMGI Underlayer‏‎ (19 revisions)
  244. Filmetrics F40-UV Microscope-Mounted‏‎ (19 revisions)
  245. Oven 5 (Labline)‏‎ (19 revisions)
  246. Tom Reynolds‏‎ (20 revisions)
  247. IR Thermal Microscope (QFI)‏‎ (20 revisions)
  248. Brian Lingg‏‎ (20 revisions)
  249. RIE 5 (PlasmaTherm)‏‎ (20 revisions)
  250. Sputter 4 (AJA ATC 2200-V)‏‎ (20 revisions)

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